Skip to content

Softbeam

Chemical Amplification Resists for Microlithography

By courtesy of:
Hiroshi Ito
Adv Polym Sci (2005) 172: 37–245

Author zhuangPosted on September 8, 2006Categories BEAM, optoElectronics

Post navigation

Previous Previous post: Fluorous Nanodroplets Structurally Confined in an Organopalladium Sphere
Next Next post: Complexity in Chemistry
admin
hobby
Poem
Scribble
media
random
Softbeam Powered by SOFTBEAM